MOSCOW, 26 Apr. The Scientific Research Institute of Molecular Electronics (NIIME), which has the status of a resident of the Technopolis Moscow SEZ, has begun developing photoresists — lithographic materials for the electronics industry, Vladislav Ovchinsky, head of the Moscow Department of Investment and Industrial Policy (DIPP), said.
“More than half of all products manufactured in the SEZ are microelectronics. The microelectronics cluster also includes the NIIME company, which plans to launch the production of domestic photoresists that are in demand in the production of integrated circuits. Russian microelectronics manufacturers will become consumers of products,” said the head of the department, the words of which are quoted by the press service of the DIPP. 1865239883.html» data->
Photoresist is a photosensitive polymer material that is applied to a silicon wafer during the photolithography process. With its help, selected areas — «windows» — are formed on the surface of the workpiece for further etching or alloying of the surface. This technology is the main one in the production of integrated circuits. Under the import substitution program, NIIME develops and analyzes high-purity chemicals for the domestic industry. In 2021, the only world-class physical and chemical analytical laboratory in Russia was established at the institute to conduct research in the field of quality control of technological media. Today, the laboratory participates in all development work on the creation of chemicals of the required quality and methods for analyzing the conformity of the quality of high-purity materials.